Challenges in realizing ultraflat materials surfaces

• Takashi Yatsui,
• Wataru Nomura,
• Fabrice Stehlin,
• Olivier Soppera,
• Makoto Naruse and
• Motoichi Ohtsu

Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99

• model that describes the scale-dependent effects of optical near-fields. Finally, we present the future outlook for these technologies. Keywords: dressed photon–phonon; phonon-assisted process; polishing; self-organized process; Review Introduction In order to improve device performance and to

• suppressed by this phonon-assisted process, whereas the bottoms of scratches were filled with Al2O3 particles. In this way, the scratches were finally repaired. Again, this demonstrates self-organized smoothing of the surface by using DPPs. Figure 5a and Figure 5b show AFM images before and after the RF